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Beilstein J. Nanotechnol. 2021, 12, 1271–1278, doi:10.3762/bjnano.12.94
Figure 1: Schematic view of the prepared structures.
Figure 2: (a) SEM image of gold plasmonic platform, (b) HRTEM image of the cross section of a single gold nan...
Figure 3: Transmittance spectrum of a gold plasmonic platform.
Figure 4: XPS spectra of Ti2p and Eu4d spectra of TiO2:Eu luminescent film.
Figure 5: UV–vis spectra of a TiO2:Eu film and TiO2:Eu films deposited on the plasmonic platform without a di...
Figure 6: Excitation and emission spectra of a TiO2:Eu film and TiO2:Eu films deposited on the plasmonic plat...
Figure 7: XPS spectra of Te 3d and Eu 4d regions of the TeO2:Eu luminescent layer.
Figure 8: Depth profile of the chemical composition of TeO2:Eu thin film.
Figure 9: UV–vis spectra of a TeO2:Eu film and TeO2:Eu films deposited on the plasmonic platform without a di...
Figure 10: Excitation and emission spectra of TeO:Eu-based structures.
Figure 11: Comparision of the maxmimum of ecxitation and emission peaks for TiO2:Eu and TeO2:Eu thin films, an...
Figure 12: UV–vis spectra of a TeO2:Eu film and TeO2:Eu films deposited on a plasmonic platform with dielectri...
Figure 13: Excitation and emission spectra of a TeO2:Eu film and TeO2:Eu films deposited on a plasmonic platfo...
Beilstein J. Nanotechnol. 2020, 11, 494–507, doi:10.3762/bjnano.11.40
Figure 1: Side view of a part of the simulation setup, illustrating the shape of the Ag nanoparticles, modell...
Figure 2: Top view of the simulation setup.
Figure 3: SEM images of the films after annealing at 250 °C for 15 min. Initial film thickness was: (a) 1 nm,...
Figure 4: SEM images of the films after annealing at 550 °C for 15 min. Initial film thickness was: (a) 1 nm,...
Figure 5: The dependence of the island diameter on the thickness of the initial film, calculated for Ag films...
Figure 6: SEM images of a 2.8 nm thick film, annealed at a constant temperature of 550 °C for different perio...
Figure 7: SEM images of a 2.8 nm thick film, annealed for a constant time 15 min at different temperatures: (...
Figure 8: (a) HRTEM image of a cross section of a nanoisland formed from a 3 nm thick film, annealed at 550 °...
Figure 9: Absorbance of nanostructures formed from thin films with different thickness, annealed at (a) 250 °...
Figure 10: Calculated scattering efficiencies (absorption, scattering and extinction) in air obtained from Mie...
Figure 11: Absorbance of nanostructures formed from 2.8 nm thick films (a) annealed at 100, 200, 300, 400, 500...
Figure 12: (a) Ag 3d and (b) Ag 4d XPS spectra of bulk Ag and Ag nanostructures grown after annealing of 2 nm ...
Figure 13: a) Calculated intensity distribution of the electromagnetic field integrated on the plane where nan...
Figure 14: Calculated amplitudes of the components of the electromagnetic field in the plane where the nanopar...
Figure 15: Calculated amplitudes of the components of the electromagnetic field as a function of the time, at ...
Figure 16: Calculated absorbance log(Φi/Φt), where Φi and Φt are incident and transmitted flux, respectively, ...
Figure 17: Positions of a) the first and b) the second absorbance maxima (corresponding to the quadrupole and ...
Beilstein J. Nanotechnol. 2018, 9, 2599–2608, doi:10.3762/bjnano.9.241
Figure 1: Scheme of the formation of the gold nanoislands.
Figure 2: SEM images of 2.8 nm Au films on a Si(111) substrate: a) as prepared, annealed at b) 150 °C, c) 200...
Figure 3: SEM images of 2.8 nm Au films on a Si(111) substrate annealed at a) 450 °C, b) 550 °C, c) 600 °C fo...
Figure 4: SEM images of Au films of different thicknesses on a Si(111) substrate annealed at 550 °C for 15 mi...
Figure 5: a) Number of nanoparticles and b) average diameter of nanoparticles as function of the Au film thic...
Figure 6: Left: AFM image of a 2.8 nm Au film on a Si(111) substrate annealed at 550 °C for 15 min; right: cr...
Figure 7: XRD result of a 2.8 nm Au film annealed at 550 °C for 15 min and an as-prepared 2.8 nm Au film on S...
Figure 8: XPS (Au region) results for the 2.8 nm Au thin film on a Si(111) substrate annealed at 550 °C for 1...
Figure 9: XPS result (Si region) for the 2.8 nm Au film on a Si(111) substrate annealed at 550 °C for 15 min.
Figure 10: Absorbance spectra recorded for a 2.8 nm Au film on a Si(111) substrate annealed at 550 °C for 15 m...
Figure 11: SEM image of the gold nanoislands on the silicon substrate (sample 2.8 nm Au film on Si(111) substr...
Figure 12: Setup for the FDTD and FDTD/DFT simulations. Left: view from the bottom, zx-plane; yellow rectangle...
Figure 13: Calculated intensity distribution of the electromagnetic field with unpolarized incident light of a...
Figure 14: Calculated amplitudes of the components of the electromagnetic field with unpolarized incident ligh...
Figure 15: Calculated absorbance (as log(Io/Ir), where Io is an incident flux, and Ir – reflected flux), as th...